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Absolute Contamination Standards
Calibrate instruments which size and detect particles on the surface of bare silicon wafers.

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Silica Contamination Standards
The Silica Contamination Standard (SCS) is used to calibrate high-intensity UV and DUV tools.

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Reticle Contamination Standards (RCS)
The Reticle Contamination Standard (RCS) is used to calibrate instruments which size and detect particles on the surface of a reticle or its protective pellicle.

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Edge Contamination Standards
The Edge Contamination Standard is designed for particle size standards calibration of instruments that detect and size particles standards on the substrate’s wafer edge.

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Leopard Contamination Standards
The Edge Contamination Standard is designed for particle size standards calibration of instruments that detect and size particles standards on the substrate’s wafer edge.

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